Any planned changes to 廷 in CN?

[NightFurySL2001]

In adobe-fonts/source-han-serif#39, the 廷 component for CN is changed to 壬 (middle horizontal stroke longest), while TW/HK uses the old 𡈼 (bottom horizontal stroke longest).

The current main Sans form in CN using 𡈼 (bottom horizontal stroke longest) is the form presented in Unicode code charts G source, but the current main Serif form in CN using 壬 (middle horizontal stroke longest) is the form presented in 通用规范汉字表. Will there be changes to Sans or this can be seen as a unifiable variation in Sans font? (both might be acceptable for CN)

[NightFurySL2001]

P/S: 𪊶 for TW seems to be wrong too.

[zhenlige]

No need. There are no files that say the middle of 廷 in CN must be 壬, and the change will introduce a lot more CIDs.

[NightFurySL2001]

@zhenlige This is the form specified in 《通用规范汉字表》(2013).

If this is not to be considered, then issue #300 should be addressed too as 辶 is not specified in any document. Hell, even 人 on top should be unified to JP form too. (see below)

[zhenlige]

@zhenlige This is the form specified in 《通用规范汉字表》(2013).

If this is not to be considered, then issue #300 should be addressed too as 辶 is not specified in any document. Hell, even 人 on top should be unified to JP form too. (see below)

I also think the differences listed above should unify.

[hfhchan]

The GB/T 2312 and GB 18030 are character set standards, not glyph standards. The Table of General Standard Chinese Characters however specifies the normative glyph shape.

The stroke length is typically not seen as a stylistic issue, unlike the stroke shapes and connection points.

[NightFurySL2001]

Update: the newest GB18030-2022 has changed the form of 廷 series to use the glyph with middle stroke longer.

[ghost]

霆 also appears to have the middle stroke longer in JP when it should be shorter than the bottom one? Here's how it should look according to JIS X 0213:2004:

And here's how it looks currently in Sans and Serif JP:


Problem could extend to other glyphs. I haven't checked thoroughly.